SiO2 Etching with Aqueous HF: Design and Development of a Laboratory-Scale In…

Abstract—Etching of SiO2 films using aqueous HF-based chemistries is widely used in integrated circuit and microelectromechanical device industries. To precisely control film loss during cleaning or etching processes, good control over the contact time between the wet chemistry and the substrate is necessary. An integrated wet etch and dry reactor system has been designed and fabricated by s…