Fabrication, Characterization, and Simulation of a Low-cost TSV Integration w…

Abstract In this study, a low-cost through-multilayer TSV integration process has been developed. The features are that a double-layer spin coating technique is applied to prevent residual photoresist left inside TSVs. Besides, redistribution layer is deposited before TSV filling in order to eliminate the front-side CMP process, which will lower the fabrication cost. Basic electrical tests of…