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Fabrication and characterization of positive and negative copper sulfide micropatterns on self-assembled monolayers

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Abstract.
Positive and negative micropatterned copper sulfide thin films were successfully fabricated through
chemical bath deposition methods. The thin films were deposited on patterned Si substrates with two
different self-assembled monolayers (SAMs), i.e., NH2/CH3 and NH2/OH terminated silane, respectively.
Under an optimal depositing condition, the copper sulfide thin films were selectively deposited on –NH2
regions. The resultant Cu2S crystal films, in positive and negative circle patterns, respectively, were
verified by SEM, XPS, XRD spectra. UV–vis spectrum analysis demonstrated that the prepared Cu2S films
exhibited high optical transmission in the visible light regions (vis) and near-infrared region (NIR), and a
low band gap of 2.48 eV.

Keywords:
Copper sulfide
Self-assembly monolayer
Micropattern
Optical property

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Informasi Detail

Judul Seri

Journal of Colloid and Interface Science

No. Panggil

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Penerbit

London : Elsevier Inc.., 2009

Deskripsi Fisik

Journal of Colloid and Interface Science 332 (2009) 32–38

Bahasa

English

ISBN/ISSN

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Klasifikasi

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Tipe Isi

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Tipe Media

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Tipe Pembawa

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Edisi

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Subjek

KIMIA

Info Detail Spesifik

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Pernyataan Tanggungjawab

agus

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