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Photodegradation of SF6 on polyisoprene surface: Implication on elimination of toxic byproducts

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Abstract.
Photodegradation of SF6 was performed on the surface of polyisoprene (PI) based on a brand new mechanism
of “controlled release of radicals”. Effective decomposition of SF6 (60% of SF6 was degraded in 4 h)
was achieved due to the highly reductive radicals (mainly allylic radicals and excited C C bond) which
were generated from the photolysis of PI. No toxic fluoride was detected by FT-IR. The PI irradiated for
200 h in SF6 circumstancewas examined by XPS to be doped with fluorine and sulfur. Fouling due to photoinitiated polymerization on UV lampwas avoided because the radicalswere released slowly. Photolysis
of SF6 in pure argon with the presence of irradiated PI showed kinetics of pseudo-first-order reaction and
the degradation rate constant was 5.16×10−5 s−1. Factors which may affect the photolysis process such
as introduction of O2 and H2O were also examined.

Keywords:
Sulfur hexafluoride
Controlled release
Reductive radical
Photodegradation
Photoinitiated polymerization

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Informasi Detail

Judul Seri

Journal of Hazardous Materials

No. Panggil

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Penerbit

London : Elsevier B.V.., 2009

Deskripsi Fisik

Journal of Hazardous Materials 168 (2009) 493–500

Bahasa

English

ISBN/ISSN

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Klasifikasi

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Tipe Isi

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Tipe Media

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Tipe Pembawa

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Edisi

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Subjek

KIMIA

Info Detail Spesifik

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Pernyataan Tanggungjawab

agus

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