e-journal

Electrical Characterization Of Aluminum (Al) Thin Films Measured By Using Four- Point Probe Method

---

ABSTRACT
This paper reports the results of electrical characterization of aluminum thin films. Uniform Al thin films were deposited by physical vapor deposition (PVD) technique on glass substrates. The electrical resistivity of the films as a function of film thickness was studied. These parameters have been measured by four-point probe method. The electrical resistivity was obtained by the measurement of current (in mA) and voltage in (mV) through the probe. The results showed that resistivity of the film decreases linearly with the film thickness in the range of the thickness studied in this work.

Keywords: Aluminum thin films, electrical resistivity (ρ), electrical conductivity (σ), sheet resistance (Rs), thickness of Al thin films, four- probe set up

---

Ketersediaan

Tidak ada salinan data

Informasi Detail

Judul Seri

KATHMANDU UNIVERSITY JOURNAL OF SCIENCE, ENGINEERING AND TECHNOLOGY

No. Panggil

-

Penerbit

KATHMANDU : KATHMANDU UNIVERSITY., 2012

Deskripsi Fisik

KATHMANDU UNIVERSITY JOURNAL OF SCIENCE, ENGINEERING AND TECHNOLOGY VOL. 8, No. II, DECEMBER, 2012, pp 31-36

Bahasa

English

ISBN/ISSN

-

Klasifikasi

-

Tipe Isi

-

Tipe Media

-

Tipe Pembawa

-

Edisi

-

Subjek

FISIKA MATERIAL

Info Detail Spesifik

-

Pernyataan Tanggungjawab

agus

Versi lain/terkait

Lampiran Berkas

Komentar

---

Anda harus masuk sebelum memberikan komentar