Gaya APA

(et.al.), P, T. (2010). Microstructure and chemical analysis of Hf-based high-k dielectric layers in metal–insulator–metal capacitors (518 (2010) 4467–4472). New York: Elsevier B.V..

Gaya MLA

(et.al.), P., Thangadurai. "Microstructure and chemical analysis of Hf-based high-k dielectric layers in metal–insulator–metal capacitors". 518 (2010) 4467–4472 New York: Elsevier B.V., 2010. e-journal.