e-book

Excimer Laser Technology [BAGIAN II]

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The aim of this book is to provide a practical guide on the fundamentals, status of present technology and applications of excimer lasers. Theoretical details have been intentionally omitted. The book has emerged from “Excimer laser technology: Laser sources, optics, systems and applications” issued earlier by a manufacturer of excimer lasers. The scope of the book has been considerably enlarged and the knowledge deepened by the participation of several renowned international researchers. Thus, it may form not only the
basis for training programs for service and maintenance personnel on excimer lasers, but serves also to address researchers, technologists and newcomers in the field of UV lasers and applications who require a thorough introduction to the field.

The book is divided into two main chapters: Fundamentals and Applications, along with a short introductory chapter, briefly covering a variety of subjects and some historical remarks and a final outlook chapter. The
chapter ‘Fundamentals’ provides a short introduction to laser physics and some descriptions of optical components needed for successful operation and application of lasers operating in the UV spectral range. This includes the special demands concerning optical materials, beam shaping optics, and beam diagnostics. The chapter ‘Applications’ opens with an overview of the various fields of actual excimer laser applications, then goes into more detail in important fields like ablative micro-fabrication, nano-structuring with femtosecond excimer laser pulses, material modification including microlithography, deposition of thin films, combustion analysis, and medical applications. At the leading edge of current research, the chapter on ultra-high intensity applications deals with the generation of “hollow atoms”. Micro-fabrication using F2-laser radiation at 157nm completes the range of UV-laser applications.

The last chapter focuses on next-generation lithography using 13.5nm radiation. Radiation sources in the extreme UV (EUV), realized by both laser and discharge pumping, are expected to transform micro-lithography
into nano-lithography. The editors and authors hope that this publication will be a valuable source of information for students, engineers, and scientists wishing to work in the field of excimer lasers.

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Ketersediaan

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Informasi Detail

Judul Seri

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No. Panggil

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Penerbit

New York : Springer-Verlag Berlin Heidelberg., 2005

Deskripsi Fisik

SPIN: 10917886 56/3141/jl 5 4 3 2 1 0. xix, 433 hlm.

Bahasa

English

ISBN/ISSN

9783540200567

Klasifikasi

621.366

Tipe Isi

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Tipe Media

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Tipe Pembawa

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Edisi

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Subjek

FISIKA MATERIAL

Info Detail Spesifik

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Pernyataan Tanggungjawab

agus

Versi lain/terkait

Lampiran Berkas

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