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Multicrystalline silicon thin film solar cells on glass with epitaxially grown emitter prepared by a two-step laser crystallization process
In this paper, we demonstrate a two-step laser crystallization process for thin film silicon solar cells on glass. In a first step a 5mm thick amorphous silicon layer is crystallized by a diode laser to get the absorber. The multicrystalline layer consists of grains with sizes in the range of 1mmto 10mm. In a second step a thin amorphous silicon layer is epitaxially crystallized by an excimer laser to form the emitter.Epitaxy was investigated in a
fluence range of 700 to 1200 mJ/cm2. The resulting thickness of the emitter is measured and numerically simulated, both resulting in 185 nm for a fluence of 1100 mJ/cm2. The solar cells achieve maximum open circuit voltages of 548mV, short-circuit current densities of up to 22.0mA/cm2 and an efficiency of 8.0%.
Keywords epitaxy, laser crystallization, multicrystalline materials, silicon, solar cells, thin films
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