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Optical and Structural Properties of Ultra-thin Gold Films
Realizing laterally continuous ultra-thin gold fi lms on transparent substrates is a challenge of signifi cant technological importance. In the present work,formation of ultra-thin gold fi lms on fused silica is studied, demonstrating how suppression of island formation and reduction of plasmonic absorption can be achieved by treating substrates with (3-mercaptopropyl) trimethoxysilane prior to deposition. Void-free fi lms with deposition thickness as low as 5.4 nm are realized and remain structurally stable at room temperature.Based on detailed structural analysis of the fi lms by specular and diffuse X-ray refl ectivity measurements, it is shown that optical transmission
properties of continuous ultra-thin fi lms can be accounted for using the bulk dielectric function of gold. However, it is important to take into account the non-abrupt transition zone between the metal and the surrounding
dielectrics, which extends through several lattice constants for the laterally continuous ultra-thin fi lms (fi lm thickness below 10 nm). This results in a signifi cant reduction of optical transmission, as compared to the case of abrupt interfaces. These fi ndings imply that the atomic-scale interface structure plays an important role when continuous ultra-thin fi lms are considered, e.g.,as semi-transparent electrical contacts, since optical transmission deviates signifi cantly from the theoretical predictions for ideal fi lms.
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