Gaya APA

[ety.al.], T, T. (2015). Feedback Control System of Wafer Temperature for Advanced Plasma Processing and its Application to Organic Film Etching (VOL. 28, NO. 4, NOVEMBER 2015). : IEEE.

Gaya MLA

[ety.al.], Takayoshi, Tsutsumi. "Feedback Control System of Wafer Temperature for Advanced Plasma Processing and its Application to Organic Film Etching". VOL. 28, NO. 4, NOVEMBER 2015 : IEEE, 2015. e-journal.