Observation and Elimination of Recoil Particles From Turbo Molecular Pumps

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Observation and Elimination of Recoil Particles From Turbo Molecular Pumps

Tsuyoshi Moriya - Nama Orang; Eiichi Sugawara - Nama Orang; Hidefumi Matsui - Nama Orang;

Abstract—The existence of recoil particles from the turbo molecular pump has been verified. The recoil particles may be the root cause of yield degradation for the vacuum processes such as the plasma etching processes. To eliminate the recoil particles, they must be trapped inside the turbo molecular
pump or inside the manifold chamber. After experimenting with various materials and designs, we have built a novel recoil particle trap and verified its effectiveness in a semiconductor production line.

Index Terms—Semiconductor device manufacture, vacuum technology, plasma applications, particle measurements

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Informasi Detail

Judul Seri: IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, VOL. 28, NO. 3, AUGUST 2015
No. Panggil: -
Penerbit: : IEEE., 2015
Deskripsi Fisik: IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, VOL. 28, NO. 3, AUGUST 2015
Bahasa: English
ISBN/ISSN: 0894-6507
Klasifikasi: -
Tipe Isi: -
Tipe Media: -
Tipe Pembawa: -
Edisi: VOL. 28, NO. 3, AUGUST 2015
Subjek: SEMIKONDUKTOR
Info Detail Spesifik: -
Pernyataan Tanggungjawab: ETY

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Observation and Elimination of Recoil Particles From Turbo Molecular Pumps

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