Gaya APA

Sagara, A. et al (2015). Thermal Behavior of Residual Defects in Low-Dose Arsenic- and Boron-Implanted Silicon After High-Temperature Rapid Thermal Annealing (VOL. 28, NO. 1, FEBRUARY 2015). : IEEE.

Gaya MLA

Sagara, Akihiko. et al. "Thermal Behavior of Residual Defects in Low-Dose Arsenic- and Boron-Implanted Silicon After High-Temperature Rapid Thermal Annealing". VOL. 28, NO. 1, FEBRUARY 2015 : IEEE, 2015. e-journal.