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e-journal

Characterization of Oxide-Coated Polysilicon Disk Resonator Gyroscope Within a Wafer-Scale Encapsulation Process

Chae Hyuck Ahn [et.al.] - Nama Orang;

Abstract—In this paper, we present the fabrication and test results of an oxide-coated polysilicon disk resonator gyroscope in a wafer-scale encapsulation process. We demonstrate the effects of an oxide coating on the device structure and the key performance parameters of resonant-based sensors, such as
the temperature coefficient of frequency and quality factor (Q). Results from the as-fabricated device show that a thin oxide coating reduces the surface roughness of a fully encapsulated device by 10×, compared with a polysilicon device without the oxide coating. This increases the uniformity across the wafer, providing higher process yield. The open-loop rate measurement mode reveals an angle random walk of 0.18°/√ hr and a bias instability of 1.43°/hr.

Index Terms—Microelectromechanical systems (MEMS) gyroscope, wineglass mode, surface roughness, oxide coating, polysilicon.


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Informasi Detail
Judul Seri
JOURNAL OF MICROELECTROMECHANICAL SYSTEMS, VOL. 24, NO. 6, DECEMBER 2015
No. Panggil
-
Penerbit
: IEEE., 2015
Deskripsi Fisik
-
Bahasa
English
ISBN/ISSN
1057-7157
Klasifikasi
-
Tipe Isi
-
Tipe Media
-
Tipe Pembawa
-
Edisi
VOL. 24, NO. 6, DECEMBER 2015
Subjek
MIKROELEKTROMEKANIKAL
Info Detail Spesifik
-
Pernyataan Tanggungjawab
ETY
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Lampiran Berkas
  • Characterization of Oxide-Coated Polysilicon Disk Resonator Gyroscope Within a Wafer-Scale Encapsulation Process
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