e-journal
Overlay Error Compensation Using Advanced Process Control With Dynamically Adjusted Proportional-Integral R2R Controller
As semiconductor manufacturing reaching nanotechnology, to obtain high resolution and alignment accuracy
via minimizing overlay errors within the tolerance is crucial. To address the needs of changing production and process conditions, this study aims to propose a novel dynamically adjusted proportional-
integral (DAPI) run-to-run (R2R) controller to adapt equipment parameters to enhance the overlay control performance. This study evaluates the performance of controllers via the variation of each overlay factor and the variation of maximum overlay errors in real settings. To validate the effectiveness of the proposed approach, an empirical study was conducted in a leading semiconductor company in Taiwan and the results showed practical viability of the proposed DAPI controller to reduce overlay errors effectively than conventional exponentially weighted moving average controller used in this company. Note to Practitioners—Although various APC/R2R control approaches have been proposed for specific conditions, little research has been done to deal with unknown changing production/process conditions in the real setting of semiconductor fabrication. Focusing on a realistic problem, this study is the first to develop
dynamically adjusted proportional-integral R2R controller by considering future disturbance prediction to effectively reduce overlay errors. The proposed DAPI controller has only one key parameters needed to be determined like exponentially weighted moving average (EWMA) controllers. The proposed approach
was validated in a leading semiconductor company in Taiwan and has been implemented on line.
Index Terms—Advanced process control (APC), manufacturing intelligence, overlay errors, proportional-integral controller, run-to-run (R2R) control, yield enhancement.
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