e-journal

Simulation Study of the Selectively Implanted Deep-N-Well for PMOS SET Mitigation

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Abstract—In this paper, a novel well structure for PMOS singleevent transient (SET) mitigation is studied by way of technology computer-aided design (TCAD) numerical simulations. Based on a 90-nm CMOS technology, the simulation results show that the proposed selectively implanted deep-N-well (SIDNW) can significantly reduce the SET pulsewidth without area, power, and performance overheads, when compared with the conventional dual-well process. A comparison is also made with the triple-well process.
Index Terms—Deep-N-well, parasitic bipolar amplification, radiation hardened by design (RHBD), single event, single-event transient (SET).

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Informasi Detail

Judul Seri

IEEE TRANSACTIONS ON DEVICE AND MATERIALS RELIABILITY

No. Panggil

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Penerbit

New York : IEEE., 2014

Deskripsi Fisik

IEEE TRANSACTIONS ON DEVICE AND MATERIALS RELIABILITY, VOL. 14, NO. 1, MARCH 2014

Bahasa

English

ISBN/ISSN

1530-4388

Klasifikasi

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Tipe Isi

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Tipe Media

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Tipe Pembawa

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Edisi

VOL. 14, NO. 1, MARCH 2014

Subjek

TEKNIK

Info Detail Spesifik

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Pernyataan Tanggungjawab

Yuli/Agus

Versi lain/terkait

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