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Optimization of ICPCVD Amorphous Silicon for Optical MEMS Applications

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Abstract—In this paper, we present the optimization of optical and mechanical properties of inductively coupled plasma chemical vapor deposited (ICPCVD) amorphous silicon thin films for fabrication of high-quality optical microelectromechanical systems-based devices operating from visible to short-wave
infrared wavelengths (450–3000 nm). Our results indicate that, at relatively high deposition temperatures for plasma CVD, a decrease in the ICP power results in films with lower tensile
stress, higher refractive index, and lower extinction coefficient. We show that hydrogen concentration alone is not a sufficient parameter for controlling optical and mechanical quality of the films. In particular, both the hydrogen concentration and the hydrogen-silicon bonding nature together play a vital role in determining the optical and the mechanical quality of the silicon thin films. As a demonstration vehicle, three layer silicon–silicon oxide–silicon-based distributed Bragg reflectors were fabricated for the visible (500–700 nm), near infrared (700–1000 nm), and short-wave infrared (2000–3000 nm) wavelength ranges using an optimized silicon fabrication recipe. The measured optical
transmission spectra show close to 90% peak reflectivity. Finally, stress optimization was evaluated by fabricating 270-μm diameter circular suspended silicon membranes, which demonstrate a flatness variation on the order of

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Informasi Detail

Judul Seri

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No. Panggil

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Penerbit

: IEEE., 2015

Deskripsi Fisik

JOURNAL OF MICROELECTROMECHANICAL SYSTEMS, VOL. 24, NO. 6, DECEMBER 2015

Bahasa

English

ISBN/ISSN

1057-7157

Klasifikasi

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Tipe Isi

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Tipe Media

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Tipe Pembawa

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Edisi

VOL. 24, NO. 6, DECEMBER 2015

Subjek

ELEKTROMEKANIKAL
OPTICAL

Info Detail Spesifik

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Pernyataan Tanggungjawab

ETY

Versi lain/terkait

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