Ditapis dengan
Stability and Control Performance Analysis of Double EWMA Controller With Met…
Abstract—This paper mainly focuses on establishing the stability conditions of the double exponentially weighted moving average (d-EWMA) controller with metrology delay when the process experiences a general disturbance and analyzing its control performance under some typical types of process disturbance. The necessary and sufficient conditions for stability are established by Routh–Hurwit…
- Edisi
- VOL. 29, NO. 1, FEBRUARY 2016
- ISBN/ISSN
- 0894-6507
- Deskripsi Fisik
- IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, VOL. 29, NO. 1, FEBRUARY 2016
- Judul Seri
- IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, VOL. 29, NO. 1, FEBRUARY 2016
- No. Panggil
- -
Adaptive Virtual Metrology Design for Semiconductor Dry Etching Process Throu…
Abstract In semiconductor manufacturing processes, virtual metrology (VM) has been investigated as a promising tool to predict important characteristics of products. Although partial least squares (PLS) is a well-known modeling technique that can cope with collinearity and therefore applied to construction of VM, its prediction performance deteriorates due to changes in process characteristic…
- Edisi
- VOL. 28, NO. 2, MAY 2015
- ISBN/ISSN
- 0894-6507
- Deskripsi Fisik
- IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, VOL. 28, NO. 2, MAY 2015
- Judul Seri
- IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, VOL. 28, NO. 2, MAY 2015
- No. Panggil
- -
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