Investigation of E-Beam Evaporated Silicon Film Properties for MEMS Applications

Abstract—This paper investigates the crystallinity, microstructure, surface morphology, stress characteristics, and Young’s Modulus of ultrahigh vacuum (UHV) electron-beam (E-beam) evaporated silicon films with a low thermal budget. The films are evaporated at various substrate temperatures ranging from 200 °C–625 °C, deposition rates ranging from 50 to 400 nm/min, and annealed at 600 …