As semiconductor manufacturing reaching nanotechnology, to obtain high resolution and alignment accuracy via minimizing overlay errors within the tolerance is crucial. To address the needs of changing production and process conditions, this study aims to propose a novel dynamically adjusted proportional- integral (DAPI) run-to-run (R2R) controller to adapt equipment parameters to enhance the …
Abstract Scheduling for wafer fabrication of advanced technology nodes entails complicated constraints such as limited waiting times. Focusing on real settings, this paper aims to develop a novel genetic algorithm of multi-subpopulation parameters with hybrid estimation of distribution (MSPHEDA) to solve the present problem effectively and efficiently. To estimate the validity of this approach…
Abstract Root cause detecting and rapid yield ramping for advanced technology nodes are crucial to maintain competitive advantages for semiconductor manufacturing. Since the data structure is increasingly complicated in a fully automated wafer fabrication facility, it is difficult to diagnose the whole production system for fault detection. A number of approaches have been proposed for fault d…