Ditapis dengan
Effects of assumed pressure distributions on the fundamental relation used in…
This short note shows that contact stiffness under a non-Hertzian pressure distribution is 33% higher than that under a Hertzian pressure distribution. This is due to the fact that there is no physical indenter that gives a non-Hertzian pressure distribution during elastic contact, and the fundamental relation used in nanoindentation data analysis does not apply. Keywords nanoindentation; fu…
- Edisi
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- ISBN/ISSN
- -
- Deskripsi Fisik
- International Journal of Mechanical Engineering Education, Volume 42, Number 1 (January 2014
- Judul Seri
- International Journal of Mechanical Engineering Education
- No. Panggil
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A Plasticity-Based Model of Material Removal in Chemical–Mechanical Polishi…
Abstract It is well known that the chemical reaction between an oxide layer and a water-based slurry produces a softer hydroxylated interface layer. During chemical–mechanical polishing (CMP), it is assumed that material removal occurs by the plastic deformation of this interface layer. In this paper, the behavior of the hydroxylated layer is modeled as a perfectly plastic material, and a me…
- Edisi
- VOL. 14, NO. 4, NOVEMBER 2001
- ISBN/ISSN
- 0894–6507
- Deskripsi Fisik
- IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, VOL. 14, NO. 4, NOVEMBER 2001
- Judul Seri
- IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, VOL. 14, NO. 4, NOVEMBER 2001
- No. Panggil
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