High rate amorphous and crystalline silicon formation by pulsed DC magnetron …

Two methods of pulsed DC magnetron sputtering deposition have been used to form high rate, hydrogen-free crystalline silicon layers. The first method is in situ crystalline silicon deposition. The second method is high rate amorphous silicon deposition followed by an anneal to induce crystallization.Over 20 mm thick crystalline silicon can be formed on wafers up to 200mm round or 156mm square.…