A Run-to-Run Profile Control Algorithm for Improving the Flatness of Nano-Sca…

In scaling-up Carbon Nanotubes (CNTs) array manufacturing, the uniformity of CNTs’ height, or flatness of array, is critical for the yield of nanodevices fabricated fromCNTs, and thus needs to be properly controlled. However, since the flatness of the CNTs array is better characterized by a profile, the conventional run-to-run (R2R) controllers that are designed for a single or multiple quali…