Active sites on Cu/SiO2 prepared using the atomic layer epitaxy technique for…

Abstract. The atomic layer epitaxy (ALE) technique has been used to prepare uniform copper nanoparticles dispersed on a silica support (ALE-Cu/SiO2 with 2.85±0.32 nm), which are highly active in the water–gas shift reaction. Infrared spectra of CO adsorption are employed to study the active sites on ALE-Cu/SiO2 surface, suggesting that two major active sites are found on the copper surfa…