Abstract We have deposited Pb0.92La0.08Zr0.52Ti0.48O3 (PLZT) films on nickel and copper substrates to create film-on-foil capacitors that exhibit excellent dielectric properties and superior breakdown strength. Measurements with PLZT films on LaNiO3-buffered Ni foils yielded the following: relative permittivity of 1300 (at 25 ◦C) and 1800 (at 150 ◦C), leakage current density of 6.6×10−9…