Photodegradation of SF6 on polyisoprene surface: Implication on elimination o…

Abstract. Photodegradation of SF6 was performed on the surface of polyisoprene (PI) based on a brand new mechanism of “controlled release of radicals”. Effective decomposition of SF6 (60% of SF6 was degraded in 4 h) was achieved due to the highly reductive radicals (mainly allylic radicals and excited C C bond) which were generated from the photolysis of PI. No toxic fluoride was detect…